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HardwareCPUs and computer architectureElectronics
A promotional fly-through of ASML's TWINSCAN EXE High NA EUV lithography machine, showing its internal optics and chipmaking capabilities.
Step into the future of advanced chipmaking with our High NA EUV platform: the TWINSCAN EXE. Committed to keep powering technology forward, together with our ecosystem, we're innovating lithography to improve the performance, functionality and energy efficiency of tomorrow's chip technology. Featuring advanced anamorphic optics and significantly faster stages, the TWINSCAN EXE platform supports 8-nanometer resolution and improves imaging contrast by 40% (compared to NXE), while delivering high productivity, lower costs and fewer defects in chip manufacturing. The EXE sets new benchmarks for transistor density and chip performance to enable multiple future nodes in logic and memory. Learn more about High NA EUV: asml.com/en/news/stories/2024/5-things-high-na-euv Dive into our nano world and follow us on social media: Facebook: facebook.com/asml/ Instagram: instagram.com/lifeatasml/ X: twitter.com/ASMLcompany LinkedIn: linkedin.com/company/asml Or visit our website: asml.comWhat people say. Highly recommended by engineers to visualize the mind-boggling complexity and scale of modern semiconductor manufacturing equipment.
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